Atomic Layer Deposition of Spin Hall Active Platinum Thin FilmsWednesday (26.09.2018) 15:45 - 16:00 S1/03 - 226 Part of:
Due to its strong spin orbit coupling platinum (Pt) is often used as a spin injector/detector in spintronics. We used atomic layer deposition (ALD) to fabricate platinum thin films on a substrate consisting of liquid phase epitaxy grown yttrium iron garnet (YIG) on gadolinium gallium garnet. Magnetotransport experiments were performed on the YIG/Pt heterostructures in three mutually orthogonal rotation planes, revealing the fingerprint of spin Hall magnetoresistance. Samples with different platinum thicknesses were used to estimate the spin transport parameters of the Pt thin films. Comparing the values for the spin Hall angle as well as the spin diffusion length with literature we found the spin diffusion length in the ALD Pt thin films agrees well with results reported for high-quality sputtered platinum. The spin Hall magnetoresistance however is smaller by approximatley a factor of 20. Our results show that one can fabricate spin Hall active Pt thin films by ALD featuring an appropriate quality for spin transport. The reported results build the framework for establishing conformal coatings for non-planar surface geometries with spin Hall active metals via ALD which in the future can provide the basis for developing 3D spintronic devices.